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PE-CVD System
PECVD
Device Overview
By supplying gas to the board surface, the equipment deposits an oxide film with chemical reaction through the use of plasma
Composition
Chamber size : ¥Õ800 x 1,500 L
Ultimate pressure : 3.0 x 10-6Torr below
Pumping speed : 5.0 x 10-5Torr/10min below
Coating material : Al(Target)
Rotary pump + Mechanical booster+ D, Pump
Gas : HMDSO,N2O,Ar
DC Power Supply
AC P