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Product descriptions
Sputtering System
Evaporation System
PE-CVD System
Ion Plating System
Others System
Vacuum components

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Ion Plating System
Ion Beam Test System

 

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Chamber size :¡Ë450 x400 
Ultimate pressure : 3.0 x 10-9 Torr below
Pumping speed : 5.0 x 10-6Torr/20min below   
Gas : Ar, N2, He, Xe, H, Ne
High Current : Beam Energy 5~10kev
Picometer
Exhausting pump : Rotary pump + Tubo Pump + Ion Pump
Arc Ion Plating system
Arc Ion Plating System
Ion Beam Test System
Ion Implant System
High Current Ion Implanter
Ion Implant System (R&D)

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